Jeff M Byers: search on Z-Library

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1

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Modeling soft-bake effects in chemically amplified resists

Byers, Jeff D., Smith, Mark D., Mack, Chris A., Biafore, John J., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 435 KB

english, 2003

2

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Novel functional nortricyclene polymers and copolymers for 248- and 193-nm chemically amplified resists

Niu, Qingshang J., Frechet, Jean M. J., Okoroanyanwu, Uzodinma, Byers, Jeff D., Willson, C. Grant, Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 449 KB

english, 1997

3

Optimization of HPLC and GC separations using response surfaces: Three experiments for the instrumental analysis laboratory

Harvey, David T., Byerly, Shannon, Bowman, Amy, Tomlin, Jeff

Journal:

Journal of Chemical Education

Year:

1991

Language:

english

File:

PDF, 5.70 MB

english, 1991

4

Theory of a scanning tunneling microscope with a two-protrusion tip

Flatté, Michael E., Byers, Jeff M.

Journal:

Physical Review B

Year:

1996

Language:

english

File:

PDF, 300 KB

english, 1996

5

SPIE Proceedings [SPIE SPIE Defense + Security - Baltimore, Maryland, United States (Monday 20 April 2015)] Chemical, Biological, Radiological, Nuclear, and Explosives (CBRNE) Sensing XVI - Trace explosives detection using photo-thermal infrared imaging spectroscopy (PT-IRIS): theory, modeling, and detection algorithms

Fountain, Augustus W., Furstenberg, Robert, Kendziora, Christopher A., Papantonakis, Michael R., Nguyen, Viet, Byers, Jeff, McGill, R. Andrew

Year:

2015

Language:

english

File:

PDF, 835 KB

english, 2015

6

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Monitoring photoacid generation in chemically amplified resist systems

Okoroanyanwu, Uzodinma, Byers, Jeff D., Cao, Ti, Webber, Stephen E., Willson, C. Grant

Year:

1998

Language:

english

File:

PDF, 382 KB

english, 1998

7

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Examination of isolated and grouped feature bias in positive-acting chemically amplified resist systems

Petersen, John S., Byers, Jeff D., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 432 KB

english, 1996

8

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Calibration of chemically amplified resist models

Byers, Jeff D., Petersen, John S., Sturtevant, John L., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 127 KB

english, 1996

9

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Polymers for 157-nm photoresist applications: a progress report

Patterson, Kyle, Yamachika, Mikio, Hung, Raymond J., Brodsky, Colin J., Yamada, Shintaro, Somervell, Mark H., Osborn, Brian, Hall, Daniel S., Dukovic, Gordana, Byers, Jeff D., Conley, Will, Willson, C

Year:

2000

Language:

english

File:

PDF, 1.40 MB

english, 2000

10

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Carbon-rich cyclopolymers: their synthesis, etch resistance, and application to 193-nm microlithography

Pasini, Dario, Low, Eric, Meagley, Robert P., Frechet, Jean M. J., Willson, C. Grant, Byers, Jeff D., Conley, Will

Year:

1999

Language:

english

File:

PDF, 869 KB

english, 1999

11

SPIE Proceedings [SPIE Microelectronic Manufacturing Technologies - Edinburgh, United Kingdom (Wednesday 19 May 1999)] Lithography for Semiconductor Manufacturing - 193-nm lithography: new challenges, new worries

McCallum, Martin, Domke, Wolf-Dieter, Byers, Jeff D., Stark, David R., Mack, Chris A., Stevenson, Tom

Year:

1999

Language:

english

File:

PDF, 1.11 MB

english, 1999

12

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Characterization and modeling of a positive-acting chemically amplified resist

Petersen, John S., Mack, Chris A., Thackeray, James W., Sinta, Roger F., Fedynyshyn, Theodore H., Mori, J. Michael, Byers, Jeff D., Miller, Daniel A., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 447 KB

english, 1995

13

Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Zimmerman, Paul A., Peski, Chris van, Rice, Bryan, Byers, Jeff, Turro, Nicholas J., Lei, Xuegong, Gejo, Juan Lopez, Liberman, Vladmir, Palmacci, Steve, Rothchild, Mordy, Whitker, Andrew, Blakey, Idris

Journal:

Journal of Photopolymer Science and Technology

Year:

2007

Language:

english

File:

PDF, 644 KB

english, 2007

14

The physics of data

Journal:

Year:

2017

Language:

english

File:

PDF, 266 KB

english, 2017

15

Anomalous magnetoconductivity of epitaxial Nd0.7Sr0.3MnO3 and Pr0.7Sr0.3MnO3 films

G.C Xiong, S.M Bhagat, Q Li, M Domínguez, H.L Ju, R.L Greene, T Venkatesan, Jeff M Byers, Mark Rubinstein

Journal:

Solid State Communications

Year:

1996

Language:

english

File:

PDF, 523 KB

english, 1996

16

Iminobiotin Binding Induces Large Fluorescent Enhancements in Avidin and Streptavidin Fluorescent Conjugates and Exhibits Diverging pH-Dependent Binding Affinities

Marc P. Raphael, Catherine A. Rappole, Lynn K. Kurihara, Joseph A. Christodoulides, Syed N. Qadri, Jeff M. Byers

Journal:

Journal of Fluorescence

Year:

2011

Language:

english

File:

PDF, 270 KB

english, 2011

17

Two-protrusion STM on an anisotropic superconductor

Jeff M. Byers, Michael E. Flatté

Journal:

Journal of Physics and Chemistry of Solids

Year:

1995

Language:

english

File:

PDF, 141 KB

english, 1995

18

The use of DNA molecular beacons as nanoscale temperature probes for microchip-based biosensors

Marc P. Raphael, Joseph A. Christodoulides, Syed N. Qadri, Syed A. Qadri, Michael M. Miller, Lynn K. Kurihara, Jeff M. Byers

Journal:

Biosensors and Bioelectronics

Year:

2008

Language:

english

File:

PDF, 645 KB

english, 2008

19

An Arabidopsis cell wall-associated kinase required for invertase activity and cell growth

Bruce D. Kohorn, Masaru Kobayashi, Sue Johansen, Jeff Riese, Li-Fen Huang, Karen Koch, Sarita Fu, Anjali Dotson, Nicole Byers

Journal:

The Plant Journal

Year:

2006

Language:

english

File:

PDF, 396 KB

english, 2006

20

Laser-gain scanning microscopy: a new characterization technique for dopant engineered gain media

Wisdom, Jeff A., Gaume, Romain M., Byer, Robert L.

Journal:

Year:

2010

Language:

english

File:

PDF, 1010 KB

english, 2010

21

A New Methodology for Quantitative LSPR Biosensing

Raphael, Marc, Christodoulides, Joseph, Byers, Jeff

Journal:

Biophysical Journal

Year:

2012

Language:

english

File:

PDF, 42 KB

english, 2012

22

Magnetic moment degradation of nanowires in biological media: real-time monitoring with SQUID magnetometry

Raphael, Marc P, Christodoulides, Joseph A, Qadri, Syed N, Simpkins, Blake S, Byers, Jeff M

Journal:

Year:

2010

Language:

english

File:

PDF, 1004 KB

english, 2010

23

SPIE Proceedings [SPIE SPIE Defense, Security, and Sensing - Baltimore, Maryland, USA (Monday 29 April 2013)] Detection and Sensing of Mines, Explosive Objects, and Obscured Targets XVIII - Infrared photothermal imaging of trace explosives on relevant substrates

Kendziora, Christopher A., Furstenberg, Robert, Papantonakis, Michael, Nguyen, Viet, Borchert, James, Byers, Jeff, McGill, R. Andrew, Broach, J. Thomas, Isaacs, Jason C.

Year:

2013

Language:

english

File:

PDF, 1.07 MB

english, 2013

24

Quantitative Imaging of Protein Secretions from Single Cells in Real Time

Raphael, Marc P., Christodoulides, Joseph A., Delehanty, James B., Long, James P., Byers, Jeff M.

Journal:

Biophysical Journal

Year:

2013

Language:

english

File:

PDF, 1.19 MB

english, 2013

25

Multicentre randomized controlled trial of structured transition on diabetes care management compared to standard diabetes care in adolescents and young adults with type 1 diabetes (Transition Trial)

Spaic, Tamara, Mahon, Jeff L, Hramiak, Irene, Byers, Nicole, Evans, Keira, Robinson, Tracy, Lawson, Margaret L, Malcolm, Janine, Goldbloom, Ellen B, Clarson, Cheril L

Journal:

Year:

2013

Language:

english

File:

PDF, 214 KB

english, 2013

26

Quantitative LSPR Imaging for Biosensing with Single Nanostructure Resolution

Raphael, Marc P., Christodoulides, Joseph A., Delehanty, James B., Long, James P., Pehrsson, Pehr E., Byers, Jeff M.

Journal:

Biophysical Journal

Year:

2013

Language:

english

File:

PDF, 923 KB

english, 2013

27

Quantitative Imaging of Protein Secretions from Single Cells in Real Time

Raphael, Marc, Christodoulides, Joseph, Delehanty, James, Long, James, Byers, Jeff

Journal:

Biophysical Journal

Year:

2014

Language:

english

File:

PDF, 62 KB

english, 2014

28

The Application of Plasmonic Nanostructures for Quantitative Measurements of Cell Secretions

Raphael, Marc P., Christodoulides, Joseph A., Delehanty, James B., Byers, Jeff M.

Journal:

Biophysical Journal

Year:

2013

Language:

english

File:

PDF, 59 KB

english, 2013

29

“Dip-Pen” Nanolithography in Registry with Photolithography for Biosensor Development

Pena, David J., Raphael, Marc P., Byers, Jeff M.

Journal:

Year:

2003

Language:

english

File:

PDF, 240 KB

english, 2003

30

A New Methodology for Quantitative LSPR Biosensing and Imaging

Raphael, Marc P., Christodoulides, Joseph A., Mulvaney, Shawn P., Miller, Michael M., Long, James P., Byers, Jeff M.

Journal:

Analytical Chemistry

Year:

2012

Language:

english

File:

PDF, 4.89 MB

english, 2012

31

Cuprates

Flatté, Michael E., Byers, Jeff M.

Journal:

Physical Review Letters

Year:

1998

Language:

english

File:

PDF, 151 KB

english, 1998

32

Local Electronic Structure of a Single Magnetic Impurity in a Superconductor

Flatté, Michael E., Byers, Jeff M.

Journal:

Physical Review Letters

Year:

1997

Language:

english

File:

PDF, 241 KB

english, 1997

33

Probing Spatial Correlations with Nanoscale Two-Contact Tunneling

Byers, Jeff M., Flatté, Michael E.

Journal:

Physical Review Letters

Year:

1995

Language:

english

File:

PDF, 316 KB

english, 1995

34

The effect of disorder and fluctuations on the magnetotransport of a double-exchange ferromagnet (abstract)

Journal:

Journal of Applied Physics

Year:

1996

Language:

english

File:

PDF, 258 KB

english, 1996

35

Using theory and evidence to drive measurement of patient, nurse and organizational outcomes of professional nursing practice

Jeffs, Lianne, Sidani, Souraya, Rose, Donald, Espin, Sherry, Smith, Orla, Martin, Kirsten, Byer, Charlie, Fu, Kaiyan, Ferris, Ella

Journal:

International Journal of Nursing Practice

Year:

2013

Language:

english

File:

PDF, 120 KB

english, 2013

36

Local electronic structure of defects in superconductors

Flatté, Michael E., Byers, Jeff M.

Journal:

Physical Review B

Year:

1997

Language:

english

File:

PDF, 498 KB

english, 1997

37

Probing Spatial Correlations with Nanoscale Two-Contact Tunneling

Byers, Jeff M., Flatté, Michael E.

Journal:

Physical Review Letters

Year:

1995

Language:

english

File:

PDF, 30 KB

english, 1995

38

Spin Diffusion in Semiconductors

Flatté, Michael E., Byers, Jeff M.

Journal:

Physical Review Letters

Year:

2000

Language:

english

File:

PDF, 56 KB

english, 2000

39

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

Wallow, Thomas I., Brock, Phillip J., Di Pietro, Richard A., Allen, Robert D., Opitz, Juliann, Sooriyakumaran, Ratnam, Hofer, Donald C., Meute, Jeff, Byers, Jeff D., Rich, Georgia K., McCallum, Martin

Year:

1998

Language:

english

File:

PDF, 739 KB

english, 1998

40

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - 3D lumped parameter model for lithographic simulations

Byers, Jeff D., Smith, Mark D., Mack, Chris A., Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 446 KB

english, 2002

41

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Improving the performance of 193-nm photoresists based on alicyclic polymers

Patterson, Kyle, Okoroanyanwu, Uzodinma, Shimokawa, Tsutomu, Cho, Sungseo, Byers, Jeff D., Willson, C. Grant, Conley, Will

Year:

1998

Language:

english

File:

PDF, 2.55 MB

english, 1998

42

Optimizing Nanoplasmonic Biosensor Sensitivity with Orientated Single Domain Antibodies

Raphael, Marc P., Christodoulides, Joseph A., Byers, Jeff M., Anderson, George P., Liu, Jinny L., Turner, Kendrick B., Goldman, Ellen R., Delehanty, James B.

Journal:

Year:

2015

Language:

english

File:

PDF, 1.14 MB

english, 2015

43

SPIE Proceedings [SPIE OE/LASE'93: Optics, Electro-Optics, & Laser Applications in Science& Engineering - Los Angeles, CA (Sunday 17 January 1993)] Laser Techniques for State-Selected and State-to-State Chemistry - Study of chiral properties of surfaces using second-harmonic generation

Yee, Herman I., Byers, Jeff D., Petralli-Mallow, Teresa P., Hicks, Janice M., Ng, Cheuk Yiu

Year:

1993

Language:

english

File:

PDF, 744 KB

english, 1993

44

SPIE Proceedings [SPIE SPIE Defense + Security - Baltimore, Maryland, United States (Monday 20 April 2015)] Micro- and Nanotechnology Sensors, Systems, and Applications VII - Detection of trace explosives on relevant substrates using a mobile platform for photothermal infrared imaging spectroscopy (PT-IRIS)

George, Thomas, Dutta, Achyut K., Islam, M. Saif, Kendziora, Christopher A., Furstenberg, Robert, Papantonakis, Michael, Nguyen, Viet, Byers, Jeff, McGill, R. Andrew

Year:

2015

Language:

english

File:

PDF, 1.58 MB

english, 2015

45

[ACM Press the 1998 ACM conference - Seattle, Washington, United States (1998.11.14-1998.11.18)] Proceedings of the 1998 ACM conference on Computer supported cooperative work - CSCW '98 - Artefact

Brandenburg, Jeff, Byerly, Boyce, Dobridge, Tom, Lin, Jinkun, Rajan, Dharmaraja, Roscoe, Timothy

Year:

1998

Language:

english

File:

PDF, 889 KB

english, 1998

46

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - New single-layer positive photoresists for 193-nm photolithography

Okoroanyanwu, Uzodinma, Shimokawa, Tsutomu, Byers, Jeff D., Medeiros, David R., Willson, C. Grant, Niu, Qingshang J., Frechet, Jean M. J., Allen, Robert D., Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 366 KB

english, 1997

47

Infrared photothermal imaging spectroscopy for detection of trace explosives on surfaces

Kendziora, Christopher A., Furstenberg, Robert, Papantonakis, Michael, Nguyen, Viet, Byers, Jeff, Andrew McGill, R.

Journal:

Year:

2015

Language:

english

File:

PDF, 2.06 MB

english, 2015

48

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Top surface imaging through silylation

Postnikov, Sergei V., Somervell, Mark H., Henderson, Clifford L., Katz, Steven, Willson, C. Grant, Byers, Jeff D., Qin, Anwei, Lin, Qinghuang

Year:

1998

Language:

english

File:

PDF, 3.70 MB

english, 1998

49

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Diffusion of photoacid generators by laser scanning confocal microscopy

Zhang, Ping, Webber, Stephen E., Mendenhall, J., Byers, Jeff D., Chao, Keith K.

Year:

1998

Language:

english

File:

PDF, 1.65 MB

english, 1998

50

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Positive- and negative-tone water-processable photoresists: a progress report

Yamada, Shintaro, Medeiros, David R., Patterson, Kyle, Jen, Wei-Lun K., Rager, Timo, Lin, Qinghuang, Lenci, Carlos, Byers, Jeff D., Havard, Jennifer M., Pasini, Dario, Frechet, Jean M. J., Willson, C.

Year:

1998

Language:

english

File:

PDF, 1.65 MB

english, 1998

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